Краткие технические характеристики:

  • Enables control of overlay error budget for sub-0.13-micron production
  • Provides a 30 percent increase in throughput over previous generation tools
  • Allows consistent, reliable and robust measurement of low-contrast targets, including STI processing.

Назначение: оборудование предназначено для высокоскоростного измерения параметров топологии, наличия дефектов, их размеров и концентрации, а также для определения качества наложения фотошаблона на пластину.

Область применения: установки измерения топологии фотошаблонов KLA-Tencor Archer предназначены для автоматического измерения топологии поверхности фотошаблонов, используемых при производстве изделий микроэлектронной техники.

Описание оборудования

Enables control of overlay error budget for sub-0.13-micron production.
Provides a 30 percent increase in throughput over previous generation tools.
Allows consistent, reliable and robust measurement of low-contrast targets, including STI processing.

Increases overall equipment effectiveness of lithography cell tools.
Provides accurate, repeatable focus position from the actual wafer surface.
Automatically transfers overlay test data to the ASML PAS 5500™ series stepper to significantly reduce non-productive stepper time, resulting in increased tool productivity.
Archer Analyzer real-time, on-tool analysis software provides mission-critical feedback, including analysis results for wafer lot dispositioning, stepper correction, and problem troubleshooting.

Archer 10 incorporates several significant improvements in automation, throughput, productivity, and precision over previous generation systems. This system is one of the industry’s most user-friendly and competitive cost-of-ownership overlay solutions for 300 mm manufacturing at the sub-0.13-micron node.

Optical Overlay Metrology Process Control
Archer 10 integrates with KLA-Tencor’s leading software management products, Archer Analyzer stepper analysis, RDM recipe data management and iSupport™ remote assistance and tool maintenance, to provide comprehensive optical overlay metrology process control.

  • Enables control of overlay error budget for sub-0.13-micron production
  • Provides a 30 percent increase in throughput over previous generation tools
  • Allows consistent, reliable and robust measurement of low-contrast targets, including STI processing.

Enables control of overlay error budget for sub-0.13-micron production.
Provides a 30 percent increase in throughput over previous generation tools.
Allows consistent, reliable and robust measurement of low-contrast targets, including STI processing.

Increases overall equipment effectiveness of lithography cell tools.
Provides accurate, repeatable focus position from the actual wafer surface.
Automatically transfers overlay test data to the ASML PAS 5500™ series stepper to significantly reduce non-productive stepper time, resulting in increased tool productivity.
Archer Analyzer real-time, on-tool analysis software provides mission-critical feedback, including analysis results for wafer lot dispositioning, stepper correction, and problem troubleshooting.

Archer 10 incorporates several significant improvements in automation, throughput, productivity, and precision over previous generation systems. This system is one of the industry’s most user-friendly and competitive cost-of-ownership overlay solutions for 300 mm manufacturing at the sub-0.13-micron node.

Optical Overlay Metrology Process Control
Archer 10 integrates with KLA-Tencor’s leading software management products, Archer Analyzer stepper analysis, RDM recipe data management and iSupport™ remote assistance and tool maintenance, to provide comprehensive optical overlay metrology process control.

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Краткие технические характеристики:

  • Enables control of overlay error budget for sub-0.13-micron production
  • Provides a 30 percent increase in throughput over previous generation tools
  • Allows consistent, reliable and robust measurement of low-contrast targets, including STI processing.